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《化学科学与工程前沿(英文)》 >> 2015年 第9卷 第2期 doi: 10.1007/s11705-015-1515-5

The role of ions in plasma catalytic carbon nanotube growth: A review

Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk-Antwerp, Belgium

录用日期: 2015-06-18 发布日期: 2015-07-14

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摘要

While it is well-known that the plasma-enhanced catalytic chemical vapor deposition (PECVD) of carbon nanotubes (CNTs) offers a number of advantages over thermal CVD, the influence of the various individual contributing factors is not well understood. Especially the role of ions is unclear, since ions in plasmas are generally associated with sputtering rather than with growing a material. Even so, various studies have demonstrated the beneficial effects of ion bombardment during the growth of CNTs. This review looks at the role of the ions in plasma-enhanced CNT growth as deduced from both experimental and simulation studies. Specific attention is paid to the beneficial effects of ion bombardment. Based on the available literature, it can be concluded that ions can be either beneficial or detrimental for carbon nanotube growth, depending on the exact conditions and the control over the growth process.

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