2001, Volume 3, Issue 2
Strategic Study of CAE >> 2001, Volume 3, Issue 2
Progress in the Study of Triacontanol (TA) and the Prospect of Its Application in Agriculture
Tongji University, Shanghai 200092, China
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Abstract
The purpose of this article is to examine the methods and equipments for abating waste gases and water produced during the manufacture of semiconductor materials and devices. Three methods and equipments are presented in this article to control three different groups of electronic wastes. The first group includes arsine and phosphine emitted during the manufacture in semiconductor materials. The abatement procedure for this group of pollutants consists in adding iodates, cupric and manganese salts to a multiple shower tower (MST) structure. The second group includes pollutants containing arsenic, phosphorus, HF, HCl, NO2 and SO3 emitted during the manufacture of semiconductor materials and devices. The abatement procedure involves mixing oxidants and alkali liquor in an oval column with a separator in the middle. The third group consists of the ions of As, P and heavy metals contained in the waste water. The abatement procedure includes adding CaCO3 and ferric salts into the waste water in a flocculation-sedimentation compact device. Test results showed that all waste gases and water after the abatement presented in this article passed the effluent standards set by the National Environmental Protection Bureau. [1]
Keywords
waste gases ; waste water ; abatement ; pollutant ; semiconductor
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References
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