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Nanopositioning and Nonlinearity Compensation for Step Imprint Lithography Tool

LU Bing-heng, LIU Hong-zhong, DING Yu-cheng, WANG Li, QIU Zhi-hui

Frontiers of Mechanical Engineering 2006, Volume 1, Issue 1,   Pages 6-13 doi: 10.1007/s11465-005-0003-x

Abstract: The innovation of this driving method is that the motion locus is monotone, nonoscillatory, and a multistep

Keywords: different     nonoscillatory     nonlinearity     integral derivative     positioning    

Title Author Date Type Operation

Nanopositioning and Nonlinearity Compensation for Step Imprint Lithography Tool

LU Bing-heng, LIU Hong-zhong, DING Yu-cheng, WANG Li, QIU Zhi-hui

Journal Article