Frontiers of Environmental Science & Engineering
>> 2009,
Volume 3,
Issue 3
doi:
10.1007/s11783-009-0034-3
Photocatalytic activity of ZnO films with micro-grid
structure
School of Physics and
Nuclear Energy Engineering, Beihang University, Beijing 100191, China;
Available online: 2009-09-05
Next
Previous
Abstract
A layer of zinc oxide (ZnO) micro-grid was deposited on the surface of ZnO film using the DC reactive magnetron sputtering method and the micro-sphere lithography technique on glass substrates. Samples of this layer were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and ultraviolet-visible light spectroscopy. X-ray diffraction showed the high crystallinity of ZnO film and the regular arrangement of the micro-grid. The micro-grid ZnO has a lower specular reflection and a higher diffuse reflection, allowing incident light to reflect two or three times to enhance the usage of light. Photocatalytic degradation experiments on methylene blue using both ZnO micro-grid and ordinary film showed that the ZnO micro-grid has better photocatalytic properties than ordinary film. The ZnO micro-grid enhanced the photocatalytic efficiency of ZnO film by 28% with a degradation time of 300min.