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Frontiers of Chemical Science and Engineering
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Low-k integration: Gas screening for cryogenic etching and plasma damage mitigation
Romain Chanson Remi Dussart Thomas Tillocher P. Lefaucheux Christian Dussarrat Jean François de Marneffe
low-
k
,nanotechnology,micro-electronics,cryo-etching,plasma processing,
Frontiers of Chemical Science and Engineering
2019.13(3) 511-516
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