A Transparent Photoresist Made of Titanium Dioxide Nanoparticle-Embedded Acrylic Resin with a Tunable Refractive Index for UV-Imprint Lithography
a State Key Laboratory of Organic–Inorganic Composites, Beijing University of Chemical Technology, Beijing 100029, China
b Research Center of the Ministry of Education for High Gravity Engineering and Technology, Beijing University of Chemical Technology, Beijing 100029, China
c BOE Technology Group Co. Ltd, Beijing 100176, China
Yinglu Liu,Dan Wang,Changlin Liu,Qianqian Hao,Jian Li,Jie-Xin Wang,Xiuyun Chen,Peng Zhong,Xibin Shao,Jian-Feng Chen, . A Transparent Photoresist Made of Titanium Dioxide Nanoparticle-Embedded Acrylic Resin with a Tunable Refractive Index for UV-Imprint Lithography[J]. Engineering, : 0 -0 . DOI: 10.1016/j.eng.2023.12.014
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