2020年 第6卷 第6期
《工程（英文）》 >> 2020年 第6卷 第6期 doi: 10.1016/j.eng.2020.05.003
Ni-Ti-Cu-V四元薄膜库中微观结构和相变的组合合成和高通量表征
a Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742, USA
b Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory, Menlo Park, CA 94025, USA
c Werkstoffe der Mikrotechnik, Ruhr-Universität Bochum, Bochum 44801, Germany
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摘要
过去70年来，基于Ni-Ti的形状记忆合金（shape memory alloy, SMA）已得到广泛使用，但是提高 其功能稳定性仍然是实现更稳健和更高级应用的关键。SMA因其能够通过可逆的马氏体转变来保 持加工后的形状而得名，它对成分的变化非常敏感。因此，用三元和四元元素合金化来微调SMA 的晶格参数和热滞，成为材料研究中的一个难题。组合材料科学允许从多种表征技术中简化合成 过程和数据管理。本研究采用磁控溅射的方法，在热氧化的硅晶片上制备了具有成分分布的Ni-TiCu-V薄膜库。使用高通量波长色散光谱、同步加速器X射线衍射和温度相关的电阻，测量研究并 确定了成分相关的相变温度和微观结构。在材料库的177种成分中，有32种成分具有形状记忆效应， 其中5种成分具有零或接近零的热滞效应。应用中，这些合金成分在给定工作温度范围内提供了选 择的灵活性。结合薄膜库的局部微观结构和组成，讨论了四元体系的相图和功能特性的相关性。
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