This paper presents the design, development, and control of a large range beam flexure-based nano servo system for the micro-stereolithography (MSL) process. As a key enabler of high accuracy in this process, a compact desktop-size beam flexure-based nanopositioner was designed with millimeter range and nanometric motion quality. This beam flexure-based motion system is highly suitable for harsh operation conditions, as no assembly or maintenance is required during the operation. From a mechanism design viewpoint, a mirror-symmetric arrangement and appropriate redundant constraints are crucial to reduce undesired parasitic motion. Detailed finite element analysis (FEA) was conducted and showed satisfactory mechanical features. With the identified dynamic models of the nanopositioner, real-time control strategies were designed and implemented into the monolithically fabricated prototype system, demonstrating the enhanced tracking capability of the MSL process. The servo system has both a millimeter operating range and a root mean square (RMS) tracking error of about 80 nm for a circular trajectory.