在光刻机可变狭缝系统（VS）中，紧凑型复合节流静压气浮导轨是实现高精度、高加速度运动的首选结构。研究表明，导轨气浮工作面上加工浅腔、凹槽等微结构可以改善负载性能。然而，微结构微米级变化对导轨性能的影响尚不清晰。文中采用作者提出的网格自适应法，定量研究了微结构四个参数的影响，揭示了微结构变化对导轨负载性能的影响规律，并利用这些规律对微结构参数进行设计。设计方法的特点在于：通过调节浅腔参数，使承载力、刚度和转动刚度的工作点都统一起来。采用文中的设计流程和调整方法，可以在一定程度上缓解供气压力的限制和各项负载性能间的相互制约。实验结果表明，采用该方法所设计导轨的转动刚度达到2.14 × 10⁴ Nm·rad^–1，提高了69.8%。在ArF光刻机上的VS上对气浮导轨进行加速扫描实验，平均扫描加速度达到67.5 m·s^–2，
达到了设计要求。

A compact multi-throttle aerostatic guideway is the preferred structure for high precision and acceleration motion in the variable-slit system (VS) of photolithography. The presence of microstructure, such as recesses and grooves, on the guideway working surface has been found to improve the loading performance. Nevertheless, the effects on the guideway performance of changing the microstructure on the micron level are not yet clear. The mesh adaptation method, which was proposed by the authors, is employed in this paper to quantitatively study the influences of four microstructure parameters. The effect of tuning these parameters on the loading performance is revealed. The level of impact determines the proposed design process of the parameters. The characteristic feature of the proposed design process is that the working points of carrying capacity, stiffness, and rotational stiffness are unified under twoway adjusting by means of recess parameters. According to the proposed design process and tuning method, the restriction of supply pressure is lifted to a certain extent and the mutual tradeoff among the loading performances is relieved. The experimental results show that the rotational stiffness of the designed guideway, based on the tuned parameters, reached 2.14 × 10⁴ Nm·rad⁻¹ and increased by 69.8%. In a scanning test of the applied VS on argon fluoride laser (ArF) photolithography, the average scanning acceleration reached 67.5 m·s⁻², meeting the design specification.