笔者设计并实现了高通量多羽流脉冲激光沉积 (MPPLD) 系统，而且与传统的高通量薄膜材料合成技术进行了比较。目前大多数组合式脉冲激光沉积 (PLD) 系统为了使沉积的薄膜厚度均匀而采用掩膜法多层薄膜沉积和沉积后退火的工艺，MPPLD则同时利用了多个PLD羽流的方向性和沉积速率的空间变化，在一个衬底上直接沉积不同成分的化合物以形成薄膜材料库。这个新系统更适合以高通量的手段制备多组分化合物薄膜材料。

A high-throughput multi-plume pulsed-laser deposition (MPPLD) system has been demonstrated and compared to previous techniques. Whereas most combinatorial pulsed-laser deposition (PLD) systems have focused on achieving thickness uniformity using sequential multilayer deposition and masking followed by post-deposition annealing, MPPLD directly deposits a compositionally varied library of compounds using the directionality of PLD plumes and the resulting spatial variations of deposition rate. This system is more suitable for high-throughput compound thin-film fabrication.