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Frontiers of Chemical Science and Engineering >> 2019, Volume 13, Issue 3 doi: 10.1007/s11705-019-1820-5
Low-k integration: Gas screening for cryogenic etching and plasma damage mitigation
. IMEC v.z.w., 3001 Leuven, Belgium.. GREMI/University of Orleans, Orleans, France.. Air Liquide Laboratories, Tsukuba, Japan
Abstract
Keywords
low-k ; nanotechnology ; micro-electronics ; cryo-etching ; plasma processing
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