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Journal Article 3

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2015 1

2012 1

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MCM-41 1

PECVD 1

a-Si:H microstructure 1

carbon nanotube (CNT) 1

defect healing 1

heterojunction solar cell 1

high pressure and high power 1

ion bombardment 1

passivation 1

photocatalyst 1

plasma enhanced chemical vapor deposition (PECVD) 1

plasma-enhanced chemical vapor deposition (PECVD) 1

titanium dioxide 1

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Preparation of TiO

Shenghung WANG, Kuohua WANG, Jihmirn JEHNG, Lichen LIU

Frontiers of Environmental Science & Engineering 2012, Volume 6, Issue 3,   Pages 304-312 doi: 10.1007/s11783-010-0297-8

Abstract: dioxide is coated on the surface of MCM-41 wafer through the plasma enhanced chemical vapor deposition (PECVD

Keywords： photocatalyst     titanium dioxide     MCM-41     plasma enhanced chemical vapor deposition (PECVD)    

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The role of ions in plasma catalytic carbon nanotube growth: A review

Erik C. Neyts

Frontiers of Chemical Science and Engineering 2015, Volume 9, Issue 2,   Pages 154-162 doi: 10.1007/s11705-015-1515-5

Abstract: While it is well-known that the plasma-enhanced catalytic chemical vapor deposition (PECVD) of carbon

Keywords： plasma-enhanced chemical vapor deposition (PECVD)     carbon nanotube (CNT)     ion bombardment     defect healing    

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Plasma enhanced chemical vapor deposition of excellent a-Si:H passivation layers for a-Si:H/c-Si heterojunction solar cells at high pressure and high power

Lei ZHAO,Wenbin ZHANG,Jingwei CHEN,Hongwei DIAO,Qi WANG,Wenjing WANG

Frontiers in Energy 2017, Volume 11, Issue 1,   Pages 85-91 doi: 10.1007/s11708-016-0437-3

Abstract: from the amorphous phase to the nanocrystalline phase by plasma enhanced chemical vapor deposition (PECVDIn this paper, intrinsic a-Si:H layers were prepared on n-type Cz c-Si substrates by 27.12 MHz PECVD

Keywords： PECVD     high pressure and high power     a-Si:H microstructure     passivation     heterojunction solar cell    

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Title Author Date Type Operation

Preparation of TiO

Shenghung WANG, Kuohua WANG, Jihmirn JEHNG, Lichen LIU

Journal Article

The role of ions in plasma catalytic carbon nanotube growth: A review

Erik C. Neyts

Journal Article

Plasma enhanced chemical vapor deposition of excellent a-Si:H passivation layers for a-Si:H/c-Si heterojunction solar cells at high pressure and high power

Lei ZHAO,Wenbin ZHANG,Jingwei CHEN,Hongwei DIAO,Qi WANG,Wenjing WANG

Journal Article