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Optimal design of a large dual-polarization microstrip reflectarray with China-coverage patterns for Research Articles

Gang ZHAO, Yong-chang JIAO, Guan-tao CHEN

Frontiers of Information Technology & Electronic Engineering 2020, Volume 21, Issue 1,   Pages 159-173 doi: 10.1631/FITEE.1900496

Abstract: A large dual-polarization microstrip reflectarray with China-coverage patterns in two operating bandsthree-layer rectangular patch element is addressed, which is suitable for the large dual-polarization reflectarrayThen, for the large broadband reflectarray with the minimum differential spatial phase delays in theFinally, a dual-band dual-polarization microstrip reflectarray with 25 305 elements is designed to coverSimulation results show that patterns of the reflectarray meet the China-coverage requirements in two

Keywords： Reflectarray     Dual-polarization     Shaped beam     Phase-only synthesis    

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Optimal design of a large dual-polarization microstrip reflectarray with China-coverage patterns for

Gang ZHAO, Yong-chang JIAO, Guan-tao CHEN

Journal Article