High-Throughput Multi-Plume Pulsed-Laser Deposition for Materials Exploration and Optimization

Samuel S. Mao; Xiaojun Zhang

doi:10.15302/J-ENG-2015065

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Engineering ›› 2015, Vol. 1 ›› Issue (3) : 367-371. DOI: 10.15302/J-ENG-2015065

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High-Throughput Multi-Plume Pulsed-Laser Deposition for Materials Exploration and Optimization

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Abstract

A high-throughput multi-plume pulsed-laser deposition (MPPLD) system has been demonstrated and compared to previous techniques. Whereas most combinatorial pulsed-laser deposition (PLD) systems have focused on achieving thickness uniformity using sequential multilayer deposition and masking followed by post-deposition annealing, MPPLD directly deposits a compositionally varied library of compounds using the directionality of PLD plumes and the resulting spatial variations of deposition rate. This system is more suitable for high-throughput compound thin-film fabrication.

Keywords

pulsed-laser deposition / high-throughput

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Samuel S. Mao, Xiaojun Zhang. High-Throughput Multi-Plume Pulsed-Laser Deposition for Materials Exploration and Optimization. Engineering, 2015, 1(3): 367‒371 https://doi.org/10.15302/J-ENG-2015065

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Acknowledgements

The authors would like to thank Dr. Paul E. Burrows for critical reading of the manuscript. This research was partially supported by the US Department of Energy.

Compliance with ethics guidelines

Samuel S. Mao and Xiaojun Zhang declare that they have no conflict of interest or financial conflicts to disclose.

Funding