蘸水笔刻蚀（dip-pen nanolithography ，DPN）技术是近年来发展起来的基于原子力显微镜（AFM）的一种 扫描探针加工技术，有着广泛的应用前景。蘸水笔技术的刻蚀过程包括AFM 针尖对墨水分子的吸附、针尖与 基底间弯月液桥的形成、墨水分子在液桥中的传输、墨水分子在基底的扩散等四个阶段，并受温度、湿度、针 尖、扫描速度等多种因素的影响。文章具体分析了蘸水笔技术在不同阶段的作用机理，综合介绍了蘸水笔刻 蚀技术在近年来的进展，包括电化学DPN 技术、DPN 的多种加工模式、DPN 的复合加工及多探针的DPN 加工 等；分析了DPN的加工特点及其应用。

Dip-pen nanolithography is a new kind of scanning probe lithography (SPL) technique based on atomic force microscopy (AFM) , and now has made a great progress. The process of dip pen lithography involves the adsorption of ink molecules on AFM tip,the formation of water meniscus,the transport of ink molecules,and diffusion of ink molecules on the substrate.More factors such as temperature,humidity,tip,scanning speed and so on will influence the process of dip pen lithography. The paper detailed analyzed the mechanism of this technique, integrated introduced the latest development, including electrochemical DPN, more-mode DPN,multiple DPN, multi-probe array DPN and so on. Finally, the paper described the characteristics and its application.