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《中国工程科学》 >> 2008年 第10卷 第7期

蘸水笔刻蚀技术(DPN) 的机理与进展

浙江师范大学交通学院, 浙江金华321004

资助项目 :浙江省教育厅资助项目(20060470) 收稿日期: 2007-07-25 发布日期: 2008-07-16 14:52:05.000

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摘要

蘸水笔刻蚀(dip-pen nanolithography ,DPN)技术是近年来发展起来的基于原子力显微镜(AFM)的一种 扫描探针加工技术,有着广泛的应用前景。蘸水笔技术的刻蚀过程包括AFM 针尖对墨水分子的吸附、针尖与 基底间弯月液桥的形成、墨水分子在液桥中的传输、墨水分子在基底的扩散等四个阶段,并受温度、湿度、针 尖、扫描速度等多种因素的影响。文章具体分析了蘸水笔技术在不同阶段的作用机理,综合介绍了蘸水笔刻 蚀技术在近年来的进展,包括电化学DPN 技术、DPN 的多种加工模式、DPN 的复合加工及多探针的DPN 加工 等;分析了DPN的加工特点及其应用。

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