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Is tailored therapy based on antibiotic susceptibility effective? a multicenter, open-label, randomized trial

Jie Pan, Zhengchao Shi, Dingsai Lin, Ningmin Yang, Fei Meng, Lang Lin, Zhencheng Jin, Qingjie Zhou, Jiansheng Wu, Jianzhong Zhang, Youming Li

《医学前沿（英文）》 2020年第14卷第1期页码 43-50 doi: 10.1007/s11684-019-0706-8

摘要： An effective eradication therapy of ( ) should be used for the first time. In this study, we assessed whether tailored therapy based on antibiotic susceptibility testing is more effective than traditional therapy. We also evaluated the factors that cause treatment failure in high-resistance areas. For this multicenter trial, we recruited 467 -positive patients. The patients were randomly assigned to receive tailored triple therapy (TATT), tailored bismuth-containing quadruple therapy (TABQT), or traditional bismuth-containing quadruple therapy (TRBQT). For the TATT and TABQT groups, antibiotic selection proceeded via susceptibility testing using an agar-dilution test. The patients in the TRBQT group were given amoxicillin, clarithromycin, esomeprazole, and bismuth. Successful eradication was defined as a negative C-urea breath test at least eight weeks after the treatment ended. Susceptibility testing was conducted using an agar-dilution test. The eradication rate was examined via intention-to-treat (ITT) and per-protocol (PP) analyses. The clarithromycin, levofloxacin, and metronidazole resistance rates were 26.12%, 28.69%, and 96.79%, respectively. Resistance against amoxicillin and furazolidone was rare. The eradication rates for TATT, TRBQT, and TABQT were 67.32%, 63.69%, and 85.99% in the ITT analysis ( <0.001) and 74.64%, 68.49%, and 91.22% in the PP analysis ( <0.001), respectively. The efficacy of TABQT was affected by clarithromycin resistance, and bismuth exerted a direct influence on TATT failure. TABQT was the most efficacious regimen for use in high-resistance regions, especially among clarithromycin-susceptible patients.

关键词： tailored triple therapy tailored bismuth-containing quadruple therapy traditional bismuth-containing quadruple therapy antibiotic susceptibility testing eradication rates

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Ultrathin microcrystalline hydrogenated Si/Ge alloyed tandem solar cells towards full solar spectrum conversion

Yu Cao, Xinyun Zhu, Xingyu Tong, Jing Zhou, Jian Ni, Jianjun Zhang, Jinbo Pang

《化学科学与工程前沿（英文）》 2020年第14卷第6期页码 997-1005 doi: 10.1007/s11705-019-1906-0

摘要： Thin film solar cells have been proved the next generation photovoltaic devices due to their low cost, less material consumption and easy mass production. Among them, micro-crystalline Si and Ge based thin film solar cells have advantages of high efficiency and ultrathin absorber layers. Yet individual junction devices are limited in photoelectric conversion efficiency because of the restricted solar spectrum range for its specific absorber. In this work, we designed and simulated a multi-junction solar cell with its four sub-cells selectively absorbing the full solar spectrum including the ultraviolet, green, red as well as near infrared range, respectively. By tuning the Ge content, the record efficiency of 24.80% has been realized with the typical quadruple junction structure of a-Si:H/a-Si Ge :H/µc-Si:H/µc-Si Ge :H. To further reduce the material cost, thickness dependent device performances have been conducted. It can be found that the design of total thickness of 4 m is the optimal device design in balancing the thickness and the . While the design of ultrathin quadruple junction device with total thickness of 2 m is the optimized device design regarding cost and long-term stability with a little bit more reduction in . These results indicated that our solar cells combine the advantages of low cost and high stability. Our work may provide a general guidance rule of utilizing the full solar spectrum for developing high efficiency and ultrathin multi-junction solar cells.

关键词： thin films solar cells quadruple junction solar cell amorphous silicon silicon germanium alloy quantum efficiency

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A nano-scale alignment method for imprint lithography

WANG Li, LU Bing-heng, DING Yu-cheng, QIU Zhi-hui, LIU Hong-zhong

《机械工程前沿（英文）》 2006年第1卷第2期页码 157-161 doi: 10.1007/s11465-006-0014-2

摘要： A novel nano-scale alignment technique based on moiré signal for room-temperature imprint lithography in the submicron realm is proposed. The moiré signals generated by two pairs of quadruple gratings on mold and wafer are optically projected onto two photo-detector arrays, then the detected moiré signals are used to estimate the alignment errors in the x and y directions. The experiment results indicate that complex differential moiré signal is sensitive to relative displacement of the mold and wafer, and the alignment accuracy obtained in the x and γ directions and in θ are 20 nm , 25 nm and 1 μrad (3σ), respectively. They can meet the requirements of alignment accuracy for submicron imprint lithography.

关键词： submicron alignment accuracy nano-scale alignment quadruple room-temperature