A nano-scale alignment method for imprint lithography

2006, Volume 1, Issue 2

Abstract

Keywords

Related Research

Frontiers of Mechanical Engineering >> 2006, Volume 1, Issue 2 doi: 10.1007/s11465-006-0014-2

A nano-scale alignment method for imprint lithography

The State-key Lab of Manufacturing Systems Engineering, Xi′an Jiaotong University, Xi′an 710049, China;

Available online: 2006-06-05

HTML27 PDF 2 Collect 0

Next Previous

Abstract

A novel nano-scale alignment technique based on moiré signal for room-temperature imprint lithography in the submicron realm is proposed. The moiré signals generated by two pairs of quadruple gratings on mold and wafer are optically projected onto two photo-detector arrays, then the detected moiré signals are used to estimate the alignment errors in the x and y directions. The experiment results indicate that complex differential moiré signal is sensitive to relative displacement of the mold and wafer, and the alignment accuracy obtained in the x and γ directions and in θ are 20 nm , 25 nm and 1 μrad (3σ), respectively. They can meet the requirements of alignment accuracy for submicron imprint lithography.

Keywords

submicron ; alignment accuracy ; nano-scale alignment ; quadruple ; room-temperature

Related Research