Development Status and Trend of China’s Excimer Laser Technology

Yuanyuan Fan; Yi Zhou; Xin Guo; Qian Wang; Chunshui Jin; Qihong Lou

doi:10.15302/J-SSCAE-2020.03.005

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Strategic Study of CAE ›› 2020, Vol. 22 ›› Issue (3) : 29-34. DOI: 10.15302/J-SSCAE-2020.03.005

Strategic Research on China’s Laser Technology and Its Application by 2035

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Development Status and Trend of China’s Excimer Laser Technology

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Abstract

Excimer laser has important applications in integrated circuit lithography, materials processing, medicine, and scientific research due to its short wavelength and high pulse energy. However, there remains a big gap in the high-end excimer laser technology between China and the international advanced level. In this article, the characteristics and development history of excimer lasers were briefly introduced first. Second, the development status and requirements of the excimer laser technology and its related typical applications were analyzed in China and abroad. Third, the main issues of the development of domestic excimer laser technology were proposed. Finally, in view of the relevant problems and needs, it is suggested that in the future, more efforts should be made to deepen the research, including basic generic technology research (design, preparation, and characterization of high-performance and high-end deep UV components, basic theory and verification research of discharge dynamics, etc.); long pulse, high repetition rate, and high energy/power technology; as well as emerging or potential application fields and derivative technologies, so as to lay the foundation for the independent and controllable development of excimer lasers in China.

Keywords

laser / excimer laser technology / material processing

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Yuanyuan Fan, Yi Zhou, Xin Guo, Qian Wang, Chunshui Jin, Qihong Lou. Development Status and Trend of China’s Excimer Laser Technology. Strategic Study of CAE, 2020, 22(3): 29‒34 https://doi.org/10.15302/J-SSCAE-2020.03.005

References

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[1]	楼祺洪, 徐捷, 傅淑芬, 等. 脉冲放电气体激光器 [M]. 北京: 科学出版社, 1993. Lou Q H, Xu J, Fu S F, et al. Gas laser with pulsed discharge [M]. Beijing: China Science Publishing & Media Ltd., 1993.

[2]	Colin W. History of gas lasers, Part 2: Pulsed gas lasers [J]. Optics & Photonics, 2010, 21(2): 20–27.

[3]	Basov N G, Danilychev V A, Popov Y M, et al. Laser operating in the vacuum region of the spectrum by excitation of liquid xenon with an electron beam [J]. JETP Letters, 1970, 12(10): 329.

[4]	Rokitski R, Ishihara T, Rao R, et al. High reliability ArF light source for double patterning immersion lithography [J]. Optical Microlithography XXIII, 2010, 7640: 1–7.

[5]	余吟山, 游利兵, 梁勖, 等. 准分子激光技术发展 [J]. 中国激光, 2010, 37(9): 2253–2270. Yu Y S, You L B, Liang X, et al. Progress of excimer lasers technology [J]. Chinese Journal of Laser, 2010, 37(9): 2253–2270.

[6]	楼祺洪, 袁志军, 张海波. 光刻技术的历史与现状 [J]. 科学, 2017, 69(3): 32–36. Lou Q H, Yuan Z J, Zhang H B. History and status of lithography [J]. Science, 2017, 69(3): 32–36.

[7]	何立文, 方晓东. 准分子激光微加工应用研究进展 [J]. 量子电子学报, 2018, 35(6): 641–648. He L W, Fang X D. Progress of application of excimer laser micromachining [J]. Chinese Journal of Quantum Electronics. 2018, 35(6): 641–648.

[8]	Wang H, Lin H, Wang C, et al. Laser drilling of structural ceramics— A review [J]. Journal of the European Ceramic Society, 2017, 37(4): 1157–1173.

[9]	赵读亮. 工业及医用准分子激光系统关键技术研究 [D]. 合肥: 中国科学技术大学(博士学位论文), 2017. Zhao D L. Study on key techniques of medical and industrial excimer laser system [D]. Hefei: University of Science and Technology of China (Doctoral dissertation), 2017.

[10]	Insung C, Hu Y J, Hyeyoung S, et al. Laser-induced phase separation of silicon carbide [J]. Nature Communications, 2016, 7: 1–14.

[11]	Mitwally M E, Tsuchiya T, Tabata O, et al. Improvement of tensile strength of freestanding single crystal silicon microstructures using localized harsh laser treatment [J]. Japanese Journal of Applied Physics, 2014, 53(6S): 1–6.

[12]	Kobayashi M, Kakizaki K, Oizumi H, et al. DUV high power lasers processing for glass and CFRP [C]. Prague: SPIE Optics + Optoelectronics, 2017.

[13]	Yuji S, Masahiro T, Tatsuya N, et al. Experimental study of CFRP cutting with nanosecond lasers [J]. Transactions of JWRI, 2013, 42(1): 23–26.

[14]	Delmdahl R, Gabler F. Excimer lasers clean CFRPs for optimized adhesive bonding [J]. The Laser User, 2013 (72): 10.

[15]	楼祺洪. 准分子激光器的发展和应用[J]. 中国激光, 1994, A21(5): 361–364. Lou Q H. Progress of excimer lasers and its applications [J]. Chinese Journal of Lasers, 1994, A21(5): 361–364.

[16]	邱佩华. 准分子激光器的技术应用走向商品化 [J]. 激光与光电子学进展, 1987 (5): 25–27. Qiu P H. Commercialization of excimer laser technology application [J]. Laser & Optoelectronics Progress, 1987 (5): 25– 27.

[17]	袁才来, 上官诚, 叶超, 等. 用193毫微米ArF准分子激光对 HgBr_2进行单光子和双光子解离的研究 [J]. 激光, 1981 (4): 62–63. Yuan C L, Shangguan C, Ye C, et al. Study on single-photon and two-photon dissociation of HgBr_2 by 193 nm ArF excimer laser [J]. Laser, 1981 (4): 62–63.

[18]	李政达. 6H-SiC单晶与YBCO超导薄膜激光抛光机理与工艺研究 [D]. 北京: 北京工业大学(博士学位论文), 2017. Li Z D. Study on laser polishing mechanism and technology of 6H silicon carbide monocrystal and YBCO superconducting film [D]. Beijing: Beijing University of Technology (Doctoral dissertation), 2017.

[19]	邓黎杰. 氢化纳米硅薄膜准分子激光诱导晶化的研究 [D]. 上海: 上海交通大学(博士学位论文), 2015. Deng L J. The study on excimer laser crystallization of nanocrystalline silicon thin films [D]. Shanghai: Shanghai Jiao Tong University (Doctoral dissertation), 2015.

[20]	Guo X, Ding J B, Zhou Y, et al. Ablation effects and mechanism of sintered silicon carbide ceramics by ArF excimer laser [J]. Chinese Optics Letters, 2018, 16(9): 59–63.