Three types of nano-scale structure have been fabricated and characterized using SEM, AFM, etc. In this paper, multilayer thin film deposition technique has been used to fabricate nano-scale structure with 20nm, 25 nm and 35 nm line-width. LER and LWR of nanoline are evaluated with an offline image analysis algorithm. The experimental results indicate that the LER/LWR of the lines is low and the uniform of the lines is high. EBL and ICP technique are employed to fabricate grating patterns with nominal height 220 nm. The result shows that the high frequency fluctuations of line edges after etching decrease, the correlation length increases and values of root mean square deviation (σ) increase. Single and multiple nano steps have been fabricated using FIB technique, and the relationship between the size of the Z-axis and energy of process are analyzed.