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nanofabrication 3

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dip-pen 1

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A review of the scalable nano-manufacturing technology for flexible devices

Wenbin HUANG,Xingtao YU,Yanhua LIU,Wen QIAO,Linsen CHEN

Frontiers of Mechanical Engineering 2017, Volume 12, Issue 1, Pages 99-109 doi: 10.1007/s11465-017-0416-3

Abstract:

Recent advances in electronic and photonic devices, such as artificial skin, wearable systems, organic and inorganic light-emitting diodes, have gained considerable commercial and scientific interest in the academe and in industries. However, low-cost and high-throughput nano-manufacturing is difficult to realize with the use of traditional photolithographic processes. In this review, we summarize the status and the limitations of current nano-patterning techniques for scalable and flexible functional devices in terms of working principle, resolution, and processing speed. Finally, several remaining unsolved problems in nano-manufacturing are discussed, and future research directions are highlighted.

Keywords： flexible nano-manufacturing flexible devices nanofabrication scalability

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A non-lithographic plasma nanoassembly technology for polymeric nanodot and silicon nanopillar fabrication

Athanasios Smyrnakis, Angelos Zeniou, Kamil Awsiuk, Vassilios Constantoudis, Evangelos Gogolides

Frontiers of Chemical Science and Engineering 2019, Volume 13, Issue 3, Pages 475-484 doi: 10.1007/s11705-019-1809-0

Abstract: In this work, we present plasma etching alone as a directed assembly method to both create the nanodot pattern on an etched polymeric (PMMA) film and transfer it to a silicon substrate for the fabrication of silicon nanopillars or cone-like nanostructuring. By using a shield to control sputtering from inside the plasma reactor, the size and shape of the resulting nanodots can be better controlled by varying plasma parameters as the bias power. The effect of the shield on inhibitor deposition on the etched surfaces was investigated by time-of-flight secondary ion mass spectroscopy (ToF-SIMS) measurements. The fabrication of quasi-ordered PMMA nanodots of a diameter of 25 nm and period of 54 nm is demonstrated. Pattern transfer to the silicon substrate using the same plasma reactor was performed in two ways: (a) a mixed fluorine-fluorocarbon-oxygen nanoscale etch plasma process was employed to fabricate silicon nanopillars with a diameter of 25 nm and an aspect ratio of 5.6, which show the same periodicity as the nanodot pattern, and (b) high etch rate cryogenic plasma process was used for pattern transfer. The result is the nanostructuring of Si by high aspect ratio nanotip or nanocone-like features that show excellent antireflective properties.

Keywords： plasma nanoassembly etching nanodots nanopillars nanofabrication

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Mechanism and development of dip-pen nanolithography （DPN）

Jiang Hongkui,Yao Tangwei,Hu Liguang,Shen Yaqiang,Yu Xianwen

Strategic Study of CAE 2008, Volume 10, Issue 7, Pages 173-179

Abstract:

Dip-pen nanolithography is a new kind of scanning probe lithography (SPL) technique based on atomic force microscopy (AFM) , and now has made a great progress. The process of dip pen lithography involves the adsorption of ink molecules on AFM tip,the formation of water meniscus,the transport of ink molecules,and diffusion of ink molecules on the substrate.More factors such as temperature,humidity,tip,scanning speed and so on will influence the process of dip pen lithography. The paper detailed analyzed the mechanism of this technique, integrated introduced the latest development, including electrochemical DPN, more-mode DPN,multiple DPN, multi-probe array DPN and so on. Finally, the paper described the characteristics and its application.

Keywords： dip-pen nanolithography atomic force microscopy nanofabrication

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High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens Article

Yueqiang Hu, Ling Li, Rong Wang, Jian Song, Hongdong Wang, Huigao Duan, Jiaxin Ji, Yonggang Meng

Engineering 2021, Volume 7, Issue 11, Pages 1623-1630 doi: 10.1016/j.eng.2020.08.019

Abstract: habstract" style="margin-top:0cm; text-align:justify; margin:6pt 0cm 0.0001pt">Simple and efficient nanofabricationparallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabricationThe proposed system holds great potential for high- freedom nanofabrication with low cost, such as planar

Keywords： Nanofabrication Surface plasmon polariton Lithography Plasmonic flying head Plasmonic lens