2020, Volume 22, Issue 3
Strategic Study of CAE >> 2020, Volume 22, Issue 3 doi: 10.15302/J-SSCAE-2020.03.005
Development Status and Trend of China’s Excimer Laser Technology
1. Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China;
2. Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China;
3. Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
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Abstract
Excimer laser has important applications in integrated circuit lithography, materials processing, medicine, and scientific research due to its short wavelength and high pulse energy. However, there remains a big gap in the high-end excimer laser technology between China and the international advanced level. In this article, the characteristics and development history of excimer lasers were briefly introduced first. Second, the development status and requirements of the excimer laser technology and its related typical applications were analyzed in China and abroad. Third, the main issues of the development of domestic excimer laser technology were proposed. Finally, in view of the relevant problems and needs, it is suggested that in the future, more efforts should be made to deepen the research, including basic generic technology research (design, preparation, and characterization of high-performance and high-end deep UV components, basic theory and verification research of discharge dynamics, etc.); long pulse, high repetition rate, and high energy/power technology; as well as emerging or potential application fields and derivative technologies, so as to lay the foundation for the independent and controllable development of excimer lasers in China.
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